Kode Mata KuliahEL4022 / 3 SKS
Penyelenggara132 - Electrical Engineering / STEI
KategoriLecture
Bahasa IndonesiaEnglish
Nama Mata KuliahTeknologi ICIC Technology
Bahan Kajian
  1. Tinjauan Sejarah Semikonduktor, Bahan, Perangkat, & IC
  2. Fabrikasi NMOSFET
  3. Pertumbuhan Kristal Silikon dan Wafer
  4. Oksidasi Silikon
  5. Pola Transfer
  6. Difusi
  7. Implantasi Ion
  8. Simulasi Proses
  9. Deposisi Film Tipis: Epitaxy, CVD & PVD
  10. Fabrikasi Transistor Bipolar
  11. Integrasi Proses; Kontak & Interkoneksi
  12. Manufaktur IC; Kemasan IC
  13. Manufaktur IC; Pengujian & Keandalan
  14. Tren dan Tantangan Masa Depan
  1. Overview of Semiconductor History, Material, Devices, & ICs
  2. NMOSFET Fabrication
  3. Crystal Growth and Silicon Wafer
  4. Silicon Oxidation
  5. Pattern Transfer
  6. Diffusion
  7. Ion Implantation
  8. Process Simulation
  9. Thin Film Deposition: Epitaxy, CVD & PVD
  10. Bipolar Transistor Fabrication
  11. Process Integration; Contact & Interconnect
  12. IC Manufacturing; IC Packaging
  13. IC Manufacturing; Test & Reliability
  14. Future Trends and Challenges
Capaian Pembelajaran Mata Kuliah (CPMK)
  1. Memahami teknologi proses fabrikasi divais semikonduktor & rangkaian terintegrasi (IC), khususnya teknologi MOSFET dan bipolar
  2. Mampu melakukan simulasi proses semikonduktor
  3. Memahami manufaktur IC
  4. Mampu menghitung atau merancang parameter proses devais sederhana
  1. Understand semiconductor devices and integrated circuit (IC) fabrication process technology, especially MOSFET and bipolar technology
  2. Able to perform semiconductor processes simulation
  3. Understand IC manufacturing process
  4. Able to calculate or design simple devices process parameters
Metode PembelajaranCeramah, Diskusi, Studi Kasus, Belajar MandiriLectures, Discussions, Case Studies, Independent Study
Modalitas PembelajaranLuring, Daring, BauranOffline, Online, Hybrid
Jenis NilaiABCDE
Metode PenilaianTugas, Kuis, Ujian, ProyekAssignment, Quiz, Exam, Project
Catatan Tambahan